Publications

Inhalt

289  L. Ghazaryan, S. Handa, P. Schmitt, V. Beladiya, V. Roddatis, A. Tünnermann, A. Szeghalmi, "Structural, optical, and mechanical properties of TiO2 nanolaminatesExternal link," NanoTechnology 32 (9) (2021).

288  P. Paul, M. G. Hafiz, P. Schmitt, C. Patzig, F. Otto, T. Fritz, A. Tünnermann, A. Szeghalmi, "Optical bandgap control in Al2O3/TiO2 heterostructures by plasma enhanced atomic layer deposition: Toward quantizing structures and tailored binary oxidesExternal link," Spectroc. Acta Pt. A-Molec. Biomolec. Spectr. 252 119508 (2021).

287  C. Rupprecht, E. Sedov, M. Klaas, H. Knopf, M. Blei, N. Lundt, S. Tongay, T. Taniguchi, K. Watanabe, U. Schulz, A. Kavokin, F. Eilenberger, S. Hofling, C. Schneider, "Manipulation of room-temperature valley-coherent exciton-polaritons in atomically thin crystals by real and artificial magnetic fieldsExternal link," 2d Mater. 7 (3), 035025 (2020).

286  K. Dietrich, M. Zilk, M. Steglich, T. Siefke, U. Hübner, T. Pertsch, C. Rockstuhl, A. Tünnermann, E.B. Kley, "Merging Top-Down and Bottom-Up Approaches to Fabricate Artificial Photonic Nanomaterials with a Deterministic Electric and Magnetic ResponseExternal link," Adv. Funct. Mater. 30 (3), 1905722 (2020).

285  G. Q. Ngo, A. George, R. T. K. Schock, A. Tuniz, E. Najafidehaghani, Z. Y. Gan, N. C. Geib, T. Bucher, H. Knopf, S. Saravi, C. Neumann, T. Luhder, E. P. Schartner, S. C. Warren-Smith, H. Ebendorff-Heidepriem, T. Pertsch, M. A. Schmidt, A. Turchanin, F. Eilenberger, "Scalable Functionalization of Optical Fibers Using Atomically Thin SemiconductorsExternal link," Adv. Mater. 32 (47), 7 (2020).

284  Y. Sekman, N. Felde, L. Ghazaryan, A. Szeghalmi, S. Schröder, "Light scattering characterization of single-layer nanoporous SiO2 antireflection coating in visible light External link," Appl. Optics 59 (5), A143-A149 (2020).

283  M. Franz, R. Junghans, P. Schmitt, A. Szeghalmi, S. E. Schulz, "Wafer-level integration of self-aligned high aspect ratio silicon 3D structures using the MACE method with Au, Pd, Pt, Cu, and IrExternal link," Beilstein J. Nanotechnol. 11, 1439-1449 (2020).

282  P. Paul, K. Pfeiffer, A. Szeghalmi, "Antireflection Coating on PMMA Substrates by Atomic Layer Deposition External link," Coatings 10(1), 64 (2020).

281  V. Beladiya, M. Becker, T. Faraz, W. M. M. Kessels, P. Schenk, F. Otto, T. Fritz, M. Grünewald, C. Helbing, K. D. Jandt, A. Tünnermann, M. Sierka, A. Szeghalmi, "Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational studyExternal link," Nanoscale 12 (3), 2089-2102 (2020).

280  A. Tuniz, O. Bickerton, F.J. Diaz, T. Käsebier, E.B. Kley, S. Kroker, S. Palomba, C.M. de Sterke, "Modular nonlinear hybrid plasmonic circuitExternal link," Nat. Commun. 11 (1), 2413 (2020).

279  S. Wengerowsky, S.K. Joshi, F. Steinlechner, J.R. Zichi, B. Liu, T. Scheidl, S.M. Dobrovolskiy, R. van der Molen, J.W.N. Los, V. Zwiller, M.A.M. Versteegh, A. Mura, D. Calonico, M. Inguscio, A. Zeilinger, A. Xuereb, R. Ursin, "Passively stable distribution of polarisation entanglement over 192 km of deployed optical fibreExternal link," npj Quantum Inform. 6 (1), 5 (2020).

278  C. Rupprecht, M. Klaas, H. Knopf, T. Taniguchi, K. Watanabe, Y. Qin, S. Tongay, S. Schröder, F. Eilenberger, S. Hofling, C. Schneider, "Demonstration of a polariton step potential by local variation of light-matter coupling in a van-der-Waals heterostructureExternal link," Opt. Express 28 (13), 18649-18657 (2020).

277  L.P. Stoevelaar, J. Berzin, F. Silvestri, S. Fasold, K.Z. Kamali, H. Knopf, F. Eilenberger, F. Setzpfandt, S.M.B. Baumer, G. Gerini, T. Pertsch, "Nanostructure-modulated planar high spectral resolution spectro-polarimeterExternal link," Opt. Express 28 (14), 19818-19836 (2020).

276  S. Stempfhuber, N. Felde, S. Schwinde, M. Trost, P. Schenk, S. Schröder, A. Tünnermann, "Influence of seed layers on optical properties of aluminum in the UV rangeExternal link," Opt. Express 28 (14), 20324-20333 (2020).

275  T. A. Goebel, M. Heusinger, R. G. Krämer, C. Matzdorf, T. O. Imogore, D. Richter, U. D. Zeitner, S. Nolte, "Femtosecond inscription of semi-aperiodic multi-notch fiber Bragg gratings using a phase maskExternal link," Opt. Express 28 (24), 35682-35694 (2020).

274  T. Siefke, C.B.R. Hurtado, J. Dickmann, W. Dickmann, T. Käseberg, J. Meyer, S. Burger, U. Zeitner, B. Bodermann, S. Kroker, "Quasi-bound states in the continuum for deep subwavelength structural information retrieval for DUV nano-optical polarizersExternal link," Opt. Express 28 (16), 23122-23132 (2020).

273  N. C. Geib, R. Hollinger, E. Haddad, P. Herrmann, F. Legare, T. Pertsch, C. Spielmann, M. Zürch, F. Eilenberger, "Discrete dispersion scan setup for measuring few-cycle laser pulses in the mid-infraredExternal link," Opt. Lett. 45 (18), 5295-5298 (2020).

272  K. Pfeiffer, L. Ghazaryan, U. Schulz, A. Szeghalmi, "Wide-Angle Broadband Antireflection Coatings Prepared by Atomic Layer DepositionExternal link," ACS Appl. Mater. Interfaces 11 (24), 21887-21894 (2019).

271  T. Bucher, A. Vaskin, R. Mupparapu, F.J.F. Löchner, A. George, K.E. Chong, S. Fasold, C. Neumann, D.-Y. Choi, F. Eilenberger, F. Setzpfandt, Y.S. Kivshar, T. Pertsch, A. Turchanin, I. Staude, "Tailoring Photoluminescence from MoS2 Monolayers by Mie-Resonant MetasurfacesExternal link," ACS Photonics 6 (4), 1002-1009 (2019).

270  L. Ghazaryan, Y. Sekman, S. Schröder, C. Muhlig, I. Stevanovic, R. Botha, M. Aghaee, M. Creatore, A. Tünnermann, A. Szeghalmi, "On the Properties of Nanoporous SiO2 Films for Single Layer Antireflection CoatingExternal link," Adv. Eng. Mater. 21 (6), 1801229 (2019).

269  K. Dietrich, M. Zilk, M. Steglich, T. Siefke, U. Hübner, T. Pertsch, C. Rockstuhl, A. Tünnermann, E.?B. Kley, "Merging top?down and bottom?up approaches to fabricate artificial photonic nanomaterials with a deterministic electric and magnetic responseExternal link," Adv. Funct. Mater. 30, 1905722 (2019).

268  M. Shcherbakov, F. Eilenberger, I.Staude, "Interaction of semiconductor metasurfaces with short laser pulses: From nonlinear-optical response toward spatiotemporal shapingExternal link," J. Appl. Phys. 126, 085705 (2019).

267  C. Stock, T. Siefke, U. Zeitner, "Metasurface-based patterned wave plates for VIS applicationsExternal link," J. Opt. Soc. Am. B-Opt. Phys. 36 (5), D97-D102 (2019).

266  M. Basset, F. Setzpfandt, F. Steinlechner, E. Beckert, T. Pertsch, M. Gräfe, "Perspectives for Applications of Quantum ImagingExternal link," Laser Photon. Rev. 13 (10), 1900097 (2019).

265  A. Gottwald, K. Wiese, T. Siefke, M. Richter, "Validation of thin film TiO2 optical constants by reflectometry and ellipsometry in the VUV spectral rangeExternal link," Meas. Sci. Technol. 30 (4), 045201 (2019).

264  M. Fink, F. Steinlechner, J. Handsteiner, J.P. Dowling, T. Scheidl, R. Ursin, "Entanglement-enhanced optical gyroscopeExternal link," New J. Phys. 21, 053010 (2019).

263  Y. Chen, M. Fink, F. Steinlechner, J.P. Torres, R. Ursin, "Hong-Ou-Mandel interferometry on a biphoton beat noteExternal link," npj Quantum Inform. 5, 43 (2019).

262  E. Wong, S. Heist, C. Bräuer-Burchardt, A. Stark, H. Babovsky, R. Kowarschik, "Optimization-based extrinsic calibration of a three-dimensional sensor composed of an array projector and a single cameraExternal link," Opt. Eng. 58 (10), 104109 (2019).

261  M. Landmann, S. Heist, P. Dietrich, P. Lutzke, I. Gebhart, J. Templin, P. Kühmstedt, A. Tünnermann, G. Notni, "High-speed 3D thermographyExternal link," Opt. Lasers Eng. 121, 448-455 (2019).

260  B. Sephton, A. Valles, F. Steinlechner, T. Konrad, J.P. Torres, F.S. Roux, A. Forbes, "Spatial mode detection by frequency upconversionExternal link," Opt. Lett. 44 (3), 586-589 (2019).

259  D. Gerz, W. Schweinberger, T.P. Butler, T. Siefke, M. Heusinger, T. Amotchkina, V. Pervak, U. Zeitner, I. Pupeza, "Mid-infrared long-pass filter for high-power applications based on grating diffractionExternal link," Opt. Lett. 44 (12), 3014-3017 (2019).

258  K. Pfeiffer, W. Dewald, A. Szeghalmi, "Antireflection coating with consistent near-neutral color on complex-shaped substrates prepared by ALDExternal link," Opt. Lett. 44 (13), 3270-3273 (2019).

257  T. Butler, D. Gerz, C. Hofer, J. Xu, C. Gaida, T. Heuermann, M. Gebhardt, L. Vamos, W. Schweinberger, J.A. Gessner, T. Siefke, M. Heusinger, U. Zeitner, A. Apolonski, N. Karpowicz, J. Limpert, F. Krausz, I. Pupeza, "Watt-scale 50-MHz source of single-cycle waveform-stable pulses in the molecular fingerprint regionExternal link," Opt. Lett. 44 (7), 1730-1733 (2019).

256  U. Elu, T. Steinle, D. Sanchez, L. Maidment, K. Zawilski, R. Schunemann, U.D. Zeitner, C. Simon-Boisson, J. Biegert, "Table-top high-energy 7 mu m OPCPA and 260 m Ho:YLF pump laserExternal link," Opt. Lett. 44 (13), 3194-3197 (2019).

255  A. Szeghalmi, , "Optical Coatings with Atomic PrecisionExternal link," Photon. Spect. Jun, 78-83 (2019).

254  N. Lundt, M. Klaas, E. Sedov, M. Waldherr, H. Knopf, M. Blei, S. Tongay, S. Klembt, T. Taniguchi, K. Watanabe, U. Schulz, A. Kavokin, S. Höfling, F. Eilenberger, C. Schneider, "Magnetic-field-induced splitting and polarization of monolayer-based valley exciton polaritonsExternal link," Phys. Rev. B 100, 121303® (2019).

253  S. Ecker, F. Bouchard, L. Bulla, F. Brandt, O. Kohout, F. Steinlechner, R. Fickler, M. Malik, Y. Guryanova, R. Ursin, M. Huber, "Overcoming Noise in Entanglement DistributionExternal link," Phys. Rev. X 9 (4), 041042 (2019).

252  T. Faraz, H.C.M. Knoops, M.A. Verheijen, C.A.A. van Helvoirt, S. Karwal, A. Sharma, V. Beladiya, A. Szeghalmi, D.M. Hausmann, J. Henri, M. Creatore, W.M.M. Kessels, "Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate TopographiesExternal link," ACS Appl. Mater. Interfaces 10 (15), 13158-13180 (2018).

251  R. Müller, L. Ghazaryan, P. Schenk, S. Wolleb, V. Beladiya, F. Otto, N. Kaiser, A. Tünnermann, T. Fritz, A. Szeghalmi, "Growth of Atomic Layer Deposited Ruthenium and Its Optical Properties at Short Wavelengths Using Ru(EtCp)(2) and OxygenExternal link," Coatings 8 (11), 413 (2018).

250  S. Heist, P. Dietrich, M. Landmann, P. Kühmstedt, G. Notni, A. Tünnermann, "GOBO projection for 3D measurements at highest frame rates: a performance analysisExternal link," Light-Sci. Appl. 7, 71 (2018).

249  M. Heusinger, D. Michaelis, T. Flügel-Paul, U.D. Zeitner, "Diffuse scattering due to stochastic disturbances of 1D-gratings on the example of line edge roughnessExternal link," Opt. Express 26 (21), 28104-28118 (2018).

248  S. Heist, C. Zhang, K. Reichwald, P. Kühmstedt, G. Notni, A. Tünnermann, "5D hyperspectral imaging: fast and accurate measurement of surface shape and spectral characteristics using structured lightExternal link," Opt. Express 26 (18), 23366-23379 (2018).

247  T. Siefke, M. Heusinger, C.B.R. Hurtado, J. Dickmann, U. Zeitner, A. Tünnermann, S. Kroker, "Line-edge roughness as a challenge for high-performance wire grid polarizers in the far ultraviolet and beyondExternal link," Opt. Express 26 (15), 19534-19547 (2018).

246  D.K. Lin, H.Y. Chen, Z.K. Liu, K. Dietrich, S. Kroker, T. Kaesebier, Y. Liu, E.B. Kley, Y.L. Hong, "Reducing Rowland ghosts in diffraction gratings by dynamic exposure near-field holographyExternal link," Opt. Lett. 43 (4), 811-814 (2018).

245  M. Paster, T. Weichelt, "New Illumination Technology for Mask Aligner LithographyExternal link," Opt. Photon. 13 (3), 25-27 (2018).

244  G.K. Tadesse, W. Eschen, R. Klas, V. Hilbert, D. Schelle, A. Nathanael, M. Zilk, M. Steinert, F. Schrempel, T. Pertsch, A. Tünnermann, J. Limpert, J. Rothhardt, "High resolution XUV Fourier transform holography on a table topExternal link," Scientific Reports 8, 8677 (2018).

243  C. Liu, C. Straif, T. Flügel-Paul, U.D. Zeitner, H. Gross, "Comparison of hyperspectral imaging spectrometer designs and the improvement of system performance with freeform surfacesExternal link," Appl. Optics 56 (24), 6894-6901 (2017).

242  S. Shestaeva, A. Bingel, P. Munzert, L. Ghazaryan, C. Patzig, A. Tünnermann, A. Szeghalmi, "Mechanical, structural, and optical properties of PEALD metallic oxides for optical applicationsExternal link," Appl. Optics 56 (4), C47-C59 (2017).

241  G. Kalkowski, K. Grabowski, G. Harnisch, T. Flugel-Paul, U. Zeitner, S. Risse, "Fused silica GRISMs manufactured by hydrophilic direct bonding at moderate heatingExternal link," Ceas Space Journal 9 (4), 433-440 (2017).

240  K. Pfeiffer, U. Schulz, A. Tünnermann, A. Szeghalmi, "Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer DepositionExternal link," Coatings 7 (8), 118 (2017).

239  B.N. Tugchin, N. Janunts, M. Steinert, K. Dietrich, E.B. Kley, A. Tünnermann, T. Pertsch, "Quasi-linearly polarized hybrid modes in tapered and metal-coated tips with circular apertures: understanding the functionality of aperture tipsExternal link," New J. Phys. 19, 063024 (2017).

238  E. Wendler, M. Bischoff, E. Schmidt, F. Schrempel, K. Ellmer, M. Kanis, R. van de Krol, "Ion beam modification of single crystalline BiVO4External link," Nucl. Instrum. Methods Phys. Res. Sect. B-Beam Interact. Mater. Atoms 409, 133-137 (2017).

237  M. Heusinger, M. Banasch, U.D. Zeitner, "Rowland ghost suppression in high efficiency spectrometer gratings fabricated by e-beam lithographyExternal link," Opt. Express 25 (6), 6182-6190 (2017).

236  T. Weichelt, Y. Bourgin, U.D. Zeitner, "Mask aligner lithography using laser illumination for versatile pattern generationExternal link," Opt. Express 25 (18), 20983-20992 (2017).

235  Y. Bourgin, D. Voigt, T. Käsebier, T. Siefke, E.-B. Kley, U. D. Zeitner , "175??nm period grating fabricated by i-line proximity mask-aligner lithography External link," Opt. Lett. 42 (19), 3816-3819 (2017).

234  R. Mac Ciarnain, D. Michaelis, T. Wehlus, A.F. Rausch, N. Danz, A. Brauer, A. Tünnermann, "Emission from outside of the emission layer in state-of-the-art phosphorescent organic light-emitting diodesExternal link," Org. Electron. 44, 115-119 (2017).

233  R. Mac Ciarnain, D. Michaelis, T. Wehlus, A.F. Rausch, S. Wehrmeister, T.D. Schmidt, W. Brutting, N. Danz, A. Brauer, A. Tünnermann, "Plasmonic Purcell effect reveals obliquely ordered phosphorescent emitters in Organic LEDsExternal link," Scientific Reports 7, 1826 (2017).

232  T. Siefke, S. Kroker, K. Pfeiffer, O. Puffky, K. Dietrich, D.Franta, I. Ohlídal, A. Szeghalmi, E.-B. Kley, A. Tünnermann, "Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral RangeExternal link," Adv. Opt. Mater. 4 (11), 1780-1786 (2016).

231  M. Steglich, T. Käsebier, E.B. Kley, A. Tünnermann, "Black Germanium fabricated by reactive ion etchingExternal link," Appl. Phys. A-Mater. Sci. Process. 122 (9), 836 (2016).

230  M. Heusinger, T. Flugel-Paul, U.D. Zeitner, "Large-scale segmentation errors in optical gratings and their unique effect onto optical scattering spectraExternal link," Appl. Phys. B-Lasers Opt. 122 (8), 222 (2016).

229  Y.F. Li, H.Y. Chen, S. Kroker, T. Käsebier, Z.K. Liu, K.Q. Qiu, Y. Liu, E.B. Kley, X.D. Xu, Y.L. Hong, S.J. Fu, "Near-field holography enhanced with antireflection coatings-an improved method for fabricating diffraction gratingsExternal link," Chin. Opt. Lett. 14 (9), 090501 (2016).

228  K. Puthankovilakam, T. Scharf, M. S. Kim, A. Naqavi, H. P. Herzig, T. Weichelt, U. Zeitner, U. Vogler, R. Völkel, "Intensity and phase fields behind phase-shifting masks studied with high-resolution interference microscopyExternal link," J. Micro-Nanolithogr. MEMS MOEMS 15 (2), 021203 (2016).

227  S. Bruynooghe, M. Schulze, M. Helgert, M. Challier, D. Tonova, M. Sundermann, T. Koch, A. Gatto, E.B. Kley, "Broadband and wide-angle hybrid antireflection coatings prepared by combining interference multilayers with subwavelength structuresExternal link," J. Nanophotonics 10 (3), 033002 (2016).

226  T.Weichelt, R. Kinder, U.D. Zeitner, "Photomask displacement technology for continuous profile generation by Mask Aligner LithographyExternal link," J. Opt. 18 (12), 125401 (2016).

225  P. Genevée, E. Ahiavi, N. Janunts, T. Pertsch, M. Oliva, E. B. Kley, A. Szeghalmi, "Blistering during the atomic layer deposition of iridiumExternal link," J. Vac. Sci. Technol. A 34 (1), 01A113 (2016).

224  L. Ghazaryan, E. B. Kley, A. Tünnermann, A. Szeghalmi, "Nanoporous SiO2 thin films made by atomic layer deposition and atomic etchingExternal link," NanoTechnology 27 (25), 255603 (2016).

223  R. Geiss, A. Sergeyev, H. Hartung, A. S. Solntsev, A. A. Sukhorukov, R. Grange, F. Schrempel, E.-B. Kley, A. Tünnermann, T. Pertsch, "Fabrication of free-standing lithium niobate nanowaveguides down to 50nm in widthExternal link," NanoTechnology 27 (6), 065301 (2016).

222  A. Bingel, O. Stenzel, P. Naujok, R. Müller, S. Shestaeva, M. Steglich, U. Schulz, N. Kaiser, A. Tünnermann , "AZO/Ag/AZO transparent conductive films: correlation between the structural, electrical, and optical properties and development of an optical model External link," Opt. Mater. Express 6(10), 3217-3232 (2016).

221  K. Pfeiffer, S. Shestaeva, A. Bingel, P. Munzert, L. Ghazaryan, C. van Helvoirt, W. M. M. Kessels, U. T. Sanli, C. Grevent, G. Schütz, M. Putkonen, I. Buchanan, L. Jensen, D. Ristau, A. Tünnermann, A. Szeghalmi, "Comparative study of ALD SiO2 thin films for optical applicationsExternal link," Opt. Mater. Express 6 (2), 660-670 (2016).

220  C. Reinlein, C. Damm, N. Lange, A. Kamm, M. Mohaupt, A. Brady, M. Goy, N. Leonhard, R. Eberhardt, U. Zeitner, A. Tünnermann, "Temporally-stable active precision mount for large opticsExternal link," Opt. Express 24 (12), 13527-13541 (2016).

219  B. N. Tugchin, N. Janunts, M. Steinert, K. Dietrich, D. Sivun, S. Ramachandran, K. V. Nerkararyan, A. Tünnermann, T. Pertsch, "Controlling the excitation of radially polarized conical plasmons in plasmonic tips in liquidsExternal link," RSC Adv. 6, 53273-53281 (2016).

218  A. Bingel, M. Steglich, P. Naujok, R. Müller, U. Schulz, N. Kaiser, A. Tünnermann, "Influence of the ZnO:Al dispersion on the performance of ZnO:Al/Ag/ZnO:Al transparent electrodesExternal link," Thin Solid Films 616, 594-600 (2016).

217  A. Sergeyev, R. Geiss, A. S. Solntsev, A. A. Sukhorukov, F. Schrempel, T. Pertsch, R. Grange, "Enhancing Guided Second-Harmonic Light in Lithium Niobate NanowiresExternal link," ACS Photonics 2 (6), 687-691 (2015).

216  B. N. Tugchin, N. Janunts, A. E. Klein, M. Steinert, S. Fasold, S. Diziain, M. Sison, E.-B. Kley, A. Tünnermann, T. Pertsch, "Plasmonic Tip Based on Excitation of Radially Polarized Conical Surface Plasmon Polariton for Detecting Longitudinal and Transversal FieldsExternal link," ACS Photonics 2 (10), 1468-1475 (2015).

215  R. Alaee, D. Lehr, R. Filter, F. Lederer, E.-B. Kley, C. Rockstuhl, A. Tünnermann, "Scattering Dark States in Multiresonant Concentric Plasmonic NanoringsExternal link," ACS Photonics 2 (8), 1085-1090 (2015).

214  M. Otto, M. Algasinger, H. Branz, B. Gesemann, T. Gimpel, K. Füchsel, T. Käsebier, S. Kontermann, S. Koynov, X. Li, V. Naumann, J. Oh, A. N. Sprafke, J. Ziegler, M. Zilk, R. B. Wehrspohn , "Black Silicon PhotovoltaicsExternal link," Adv. Opt. Mater. 3 (2), 147-164 (2015).

213  M. Beier, J. Hartung, T. Peschel, C. Damm, A. Gebhardt, S. Scheiding, D. Stumpf, U. D. Zeitner, S. Risse, R. Eberhardt, A. Tünnermann, "Development, fabrication, and testing of an anamorphic imaging snap-together freeform telescopeExternal link," Appl. Optics 54 (12), 3530-3542 (2015).

212  M. Steglich, M. Oehme, T. Käsebier, M. Zilk, K. Kostecki, E.-B. Kley, J. Schulze, A. Tünnermann, "Ge-on-Si photodiode with black silicon boosted responsivityExternal link," Appl. Phys. Lett. 107 (5), 051103 (2015).

211  S. Leavey, B. W. Barr, A. S. Bell, N. Gordon, C. Graef, S. Hild, S. H. Huttner, E.-B. Kley, S. Kroker, J. Macarthur, C. Messenger, M. Pitkin, B. Sorazu, K. Strain, A. Tünnermann, "Upper limit to the transverse to longitudinal motion coupling of a waveguide mirrorExternal link," Class. Quantum Gravity 32 (17), 175005 (2015).

210  S. Kroker, R. Nawrodt, "The Einstein TelescopeExternal link," IEEE Instrum. Meas. Mag. 18(3), 4-8 (2015).

209  M. Steglich, T. Käsebier, F. Schrempel, E.-B. Kley, A. Tünnermann, "Self-organized, effective medium Black Silicon for infrared antireflectionExternal link," Infrared Phys. Technol. 69, 218-221 (2015).

208  T. Weichelt, L. Stürzebecher, U. D. Zeitner, "Optimized lithography process for through-silicon vias-fabrication using a double-sided (structured) photomask for mask aligner lithographyExternal link," J. Micro-Nanolithogr. MEMS MOEMS 14 (3), 034501 (2015).

207  R. Geiss, J. Brandt, H. Hartung, A. Tünnermann, T. Pertsch, E.-B. Kley, F. Schrempel, "Photonic microstructures in lithium niobate by potassium hydroxide-assisted ion beam-enhanced etchingExternal link," J. Vac. Sci. Technol. B 33 (1), 010601 (2015).

206  S. Ratzsch, E.-B. Kley, A. Tünnermann, A. Szeghalmi, "Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIASExternal link," Materials 8 (11), 7805-7812 (2015).

205  L. Stürzebecher, F. Fuchs, U.D. Zeitner, A. Tünnermann, "High resolution proximity lithography for nano-optical componentsExternal link," Microelectron. Eng. 132, 120-134 (2015).

204  D. Lehr, J. Reinhold, I. Thiele, H. Hartung, K. Dietrich, C. Menzel, T. Pertsch, E.-B. Kley, A. Tünnermann, "Enhancing Second Harmonic Generation in Gold Nanoring Resonators Filled with Lithium NiobateExternal link," Nano Lett. 15 (2), 1025?1030 (2015).

203  R. Geiss, A. Sergeyev, H. Hartung, A. Solntsev, A. Sukhorukov, R. Grange, F. Schrempel, E.-B. Kley, A. Tünnermann, T. Pertsch, "Fabrication of free-standing lithium niobate nanowaveguides down to 50 nm in widthExternal link," NanoTechnology 27, 065301 (2015).

202  S. Ratzsch, E.-B. Kley, A. Tünnermann, A. Szeghalmi, "Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxideExternal link," NanoTechnology 26 (2), 024003 (2015).

201  T. Paul, A. Matthes, T. Harzendorf, S. Ratzsch, U.D. Zeitner , "Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratingsExternal link," Opt. Mater. Express 5, 124-129 (2015).

200  S. Ratzsch, E.-B. Kley, A. Tünnermann, A. Szeghalmi, "Encapsulation process for diffraction gratings.External link," Opt. Express 23 (14), 17955-65 (2015).

199  Y. Bourgin, T. Siefke, T. Käsebier, P. Genevee, A. Szeghalmi, E.-B. Kley, U. D. Zeitner, "Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithographyExternal link," Opt. Express 23 (13), 16628-37 (2015).

198  M. Meinders, S. Kroker, A. P. Singh, E.-B. Kley, A. Tünnermann, K. Danzmann, R. Schnabel, "Cancellation of lateral displacement noise of three-port gratings for coupling light to cavities.External link," Opt. Lett. 40 (9), 2053-2055 (2015).

197  R. Alaee, R. Filter, D. Lehr, F. Lederer, C. Rockstuhl , "A generalized Kerker condition for highly directive nanoantennas External link," Opt. Lett. 40 (11), 2645-2648 (2015).

196  R. Geiss, S. Saravi, A. Sergeyev, S. Diziain, F. Setzpfandt, F. Schrempel, R. Grange, E.-B. Kley, A. Tünnermann, T. Pertsch, "Fabrication of nanoscale lithium niobate waveguides for second-harmonic generationExternal link," Opt. Lett. 40 (12), 2715-2718 (2015).

195  O. Stenzel, S. Wilbrandt, X. Chen, R. Schlegel, L. Coriand, A. Duparré, U. Zeitner, T. Benkenstein, C. Wächter, "Observation of the waveguide resonance in a periodically patterned high refractive index broadband antireflection coatingExternal link," Appl. Optics 53 (14), 3147-3156 (2014).

194  T. Weber, S. Kroker, T. Käsebier, E.-B. Kley, A. Tünnermann, "Silicon wire grid polarizer for ultraviolet applicationsExternal link," Appl. Optics 53 (34), 8140-8144 (2014).

193  D. Stumpf, U.D. Zeitner, "Extending standard mask lithography exposure technique to spherical surfacesExternal link," Appl. Phys. B-Lasers Opt. 115 (3), 371-377 (2014).

192  D. Lehr, R. Alaee, R. Filter, K. Dietrich, T. Siefke, C. Rockstuhl, F. Lederer, E.-B. Kley, A. Tünnermann, "Plasmonic nanoring fabrication tuned to pitch: Efficient, deterministic, and large scale realization of ultra-small gaps for next generation plasmonic devicesExternal link," Appl. Phys. Lett. 105 (14), 143110 (2014).

191  K. Dietrich, C. Menzel, D. Lehr, O. Puffky, U. Hübner, T. Pertsch, A. Tünnermann, E.-B. Kley, "Elevating optical activity: Efficient on-edge lithography of three-dimensional starfish metamaterialExternal link," Appl. Phys. Lett. 104, 193107 (2014).

190  S. P. Scheeler, D. Lehr, E.-B. Kley, C. Pacholski, "Top-up fabrication of gold nanorings.External link," Chem.-Asian J. 9 (8), 2072-2076 (2014).

189  A. Cumming, L. Cunningham, G.D. Hammond, K. Haughian, J. Hough, S. Kroker, I. W. Martin, R. Nawrodt, S. Rowan, C. Schwarz, A. A. van Veggel, "Silicon mirror suspensions for gravitational wave detectors External link," Class. Quantum Gravity 31, 025017 (2014).

188  M. Steglich, T. Käsebier, M. Zilk, T. Pertsch, E.-B. Kley, A. Tünnermann, "The structural and optical properties of black silicon by inductively coupled plasma reactive ion etchingExternal link," J. Appl. Phys. 116 (17), 173503 (2014).

187  M. Steglich, D. Lehr, S. Ratzsch, T. Käsebier, F. Schrempel, E.-B. Kley, A. Tünnermann, "An ultra-black silicon absorberExternal link," Laser Photon. Rev. 8 (2), L13-L17 (2014).

186  K. Keskinbora, A.-L. Robisch, M. Mayer, U. T. Sanli, C. Grevent, C. Wolter, M. Weigand, A. Szeghalmi, M. Knez, T. Salditt, G. Schutz, "Multilayer Fresnel zone plates for high energy radiation resolve 21 nm features at 1.2 keV.External link," Opt. Express 22 (15), 18440-18453 (2014).

185  T. Weichelt, U. Vogler, L. Stürzebecher, R. Völkel, U.D. Zeitner, "Resolution enhancement for advanced mask aligner lithography using phase shifting photomasksExternal link," Opt. Express 22, 16310-16321 (2014).

184  L. Stürzebecher, F. Fuchs, T. Harzendorf, U.D. Zeitner, "Pulse compression grating fabrication by diffractive proximity photolithographyExternal link," Opt. Lett. 39 (4), 1042 - 1045 (2014).

183  T. Siefke, D. Lehr, T. Weber, D. Voigt, E.-B. Kley, A. Tünnermann, "Fabrication influences on deep-ultraviolet tungsten wire grid polarizers manufactured by double patterningExternal link," Opt. Lett. 39 (22), 6434-6437 (2014).

182  Y. Bourgin, T. Kasebier, U. D. Zeitner, "250nm period grating transferred by proximity i-line mask-aligner lithography.External link," Opt. Lett. 39 (6), 1665-8 (2014).

181  Y. Bourgin, T. Käsebier, U.D. Zeitner, "250nm period grating transferred by proximity i-line mask-aligner lithographyExternal link," Opt. Lett. 39 (6), 1665 (2014).

180  R. Geiss, S. Diziain, M. Steinert, F. Schrempel, E.-B. Kley, A. Tünnermann, T. Pertsch, "Photonic crystals in lithium niobate by combining focussed ion beam writing and ion-beam enhanced etchingExternal link," Phys. Status Solidi A-Appl. Mat. 211 (10), 2421-2425 (2014).

179  A. Bingel, K. Füchsel, N. Kaiser, A. Tünnermann, "ZnO:Al films prepared by inline DC magnetron sputteringExternal link," Adv. Opt. Technol. 3 (1), 103?111 (2013).

178  M. Steglich, C. Patzig, L. Berthold, F. Schrempel, K. Füchsel, T. Höche, E. B. Kley, A. Tünnermann, "Heteroepitaxial Ge-on-Si by DC magnetron sputteringExternal link," AIP Adv. 3 (7), (2013).

177  C. Schmidt, A. Chipouline, T. Käsebier, E. B. Kley, A. Tünnermann, T. Pertsch, "Differential all-optical tuning of eigenmodes in coupled microdisksExternal link," Appl. Phys. Lett. 103 (4), 041115 (2013).

176  M. Oliva, D. Michaelis, F. Fuchs, A. Tünnermann, U. D. Zeitner, "Highly efficient broadband blazed grating in resonance domainExternal link," Appl. Phys. Lett. 102 (20), 203114 (2013).

175  M. Steglich, M. Zilk, F. Schrempel, A. Tünnermann, E.-B. Kley, "Improvement of Ge-on-Si photodiodes by black silicon trappingExternal link," Appl. Phys. Lett. 102, 111110 (2013).

174  S. Diziain, R. Geiss, M. Zilk, F. Schrempel, E. B. Kley, A. Tünnermann, T. Pertsch, "Second harmonic generation in free-standing lithium niobate photonic crystal L3 cavityExternal link," Appl. Phys. Lett. 103 (5), 051117 (2013).

173  S. Kroker, T. Käsebier, S. Steiner, E. B. Kley, A. Tünnermann, "High efficiency two-dimensional grating reflectors with angularly tunable polarization efficiencyExternal link," Appl. Phys. Lett. 102 (16), 161111 (2013).

172  M. Steglich, T. Käsebier, I. Höger, K. Füchsel, A. Tünnermann, E.-B. Kley, "Black Silicon nanostructures on silicon thin films prepared by reactive ion etchingExternal link," Chin. Opt. Lett. 11, S10502 (2013).

171  R. Nawrodt, C. Schwarz, S. Kroker, I. W. Martin, R. Bassiri, F. Brückner, L. Cunningham, G. D. Hammond, D. Heinert, J. Hough, T. Käsebier, E. B. Kley, R. Neubert, S. Reid, S. Rowan, P. Seidel, A. Tünnermann, "Investigation of mechanical losses of thin silicon flexures at low temperaturesExternal link," Class. Quantum Gravity 30 (11), 115008 (2013).

170  M. Steglich, M. Zilk, A. Bingel, C. Patzig, T. Käsebier, F. Schrempel, E.-B. Kley, A. Tünnermann, "A normal-incidence PtSi photoemissive detector with black silicon light-trappingExternal link," J. Appl. Phys. 114, 183102 (2013).

169  L. Ghazaryan, E. B. Kley, A. Tünnermann, A. V. Szeghalmi, "Stability and annealing of alucones and alucone alloysExternal link," J. Vac. Sci. Technol. A 31 (1), 01A149 (2013).

168  G. Kalkowski, T. Benkenstein, C. Rothhardt, F. Fuchs, U. D. Zeitner, "Direct bonding for the encapsulation of transverse optical gratingsExternal link," Microelectron. Eng. 110, 302-306 (2013).

167  T. W. H. Oates, B. Dastmalchi, C. Helgert, L. Reissmann, U. Hübner, E. B. Kley, M. A. Verschuuren, I. Bergmair, T. Pertsch, K. Hingerl, K. Hinrichs, "Optical activity in sub-wavelength metallic grids and fishnet metamaterials in the conical mountExternal link," Opt. Mater. Express 3 (4), 439-451 (2013).

166  A. Sergeyev, R. Geiss, A. S. Solntsev, A. Steinbrück, F. Schrempel, E. B. Kley, T. Pertsch, R. Grange, "Second-harmonic generation in lithium niobate nanowires for local fluorescence excitationExternal link," Opt. Express 21 (16), 19012-19021 (2013).

165  H. C. Eckstein, U. D. Zeitner, "Modeling electro-optical characteristics of broad area semiconductor lasers based on a quasi-stationary multimode analysisExternal link," Opt. Express 21 (20), 23231-23240 (2013).

164  M. Trost, S. Schroder, A. Duparre, S. Risse, T. Feigl, U. D. Zeitner, A. Tünnermann, "Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sourcesExternal link," Opt. Express 21 (23), 27852-27864 (2013).

163  W. Eckstein, E. B. Kley, A. Tünnermann, "Comparison of different simulation methods for effective medium computer generated hologramsExternal link," Opt. Express 21 (10), 12424-12433 (2013).

162  C. Eckstein, U. Zeitner, A. Tünnermann, U. Strauss, W. Schmid, C. Lauer, "Mode shaping in semiconductor broad area lasers by monolithically integrated phase structuresExternal link," Opt. Lett. 38 (21), 4480-4482 (2013).

161  S. Kroker, T. Käsebier, E. B. Kley, A. Tünnermann, "Coupled grating reflectors with highly angular tolerant reflectanceExternal link," Opt. Lett. 38 (17), 3336-3339 (2013).

160  D. Heinert, S. Kroker, D. Friedrich, S. Hild, E. B. Kley, S. Leavey, I. W. Martin, R. Nawrodt, A. Tünnermann, S. P. Vyatchanin, K. Yamamoto, "Calculation of thermal noise in grating reflectorsExternal link," Phys. Rev. D 88 (4), 042001 (2013).

159  B. Walther, C. Helgert, C. Rockstuhl, F. Setzpfandt, F. Eilenberger, E.-B. Kley, F. Lederer, A. Tünnermann,T. Pertsch, "Spatial and spectral light shaping with metamaterialsExternal link," Adv. Mater. 24 (47), 6300-6304 (2012).

158  K. Dietrich, D. Lehr, C. Helgert, A. Tünnermann, E.-B. Kley, "Circular Dichroism from Chiral Nanomaterial Fabricated by On-Edge LithographyExternal link," Adv. Mater. 24 (44), OP321-OP325 (2012).

157  C. Pacholski, C. Morhard, J. P. Spatz, D. Lehr, M. Schulze, E.-B. Kley, A. Tünnermann, M. Helgert, M. Sundermann, R. Brunner, "Antireflective subwavelength structures on microlens arrays-comparison of various manufacturing techniquesExternal link," Appl. Optics 51 (1), 8-14 (2012).

156  T. Weber, T. Käsebier, M. Helgert, E.-B. Kley, A. Tünnermann, "Tungsten wire grid polarizer for applications in the DUV spectral rangeExternal link," Appl. Optics 51 (16), 3224-3227 (2012).

155  U.D. Zeitner, M. Oliva, F. Fuchs, D. Michaelis, T. Benkenstein, T. Harzendorf, E.-B. Kley, "High-performance diffraction gratings made by e-beam lithographyExternal link," Appl. Phys. A-Mater. Sci. Process. 109 (4), 789-796 (2012).

154  B. Sathyaprakash, E.-B. Kley, S. Kroker, K. Yamamoto, et. al., "Scientific objectives of Einstein TelescopeExternal link," Class. Quantum Gravity 29, 124013 (2012).

153  Y. Jourlin, S. Tonchev, O. Parriaux, J. Sauvage-Vincent, T. Harzendorf, U. Zeitner, "Waveguide Grating Radial Polarizer for the Photolithography of Circularly Symmetrical Optical ElementsExternal link," IEEE Photonics J. 4, 1728-1736 (2012).

152  F. Burmeister, S. Steenhusen, R. Houbertz, U. D. Zeitner, S. Nolte, A. Tünnermann, "Materials and technologies for fabrication of three-dimensional microstructures with sub-100 nm feature sizes by two-photon polymerizationExternal link," J. Laser Appl. 24(4), 042014 (2012).

151  M. Oliva, D. Michaelis, P. Dannberg, M. Jozwik, K. Lizewski, M. Kujawinska, U.D. Zeitner, "Twyman-Green-type integrated laser interferometer array for parallel MEMS testingExternal link," J. Microelectromech. Syst. 22, 015018 (2012).

150  M. Losurdo, I. Bergmair, M.M. Giangregorio, B. Dastmalchi, G.V. Bianco, C. Helgert, E. Pshenay-Severin, M. Falkner, T. Pertsch, E.-B. Kley, U. Hübner, M.A. Verschuuren, M. Mühlberger, K. Hingerl, G. Bruno, "Enhancing chemical and optical stability of Silver nanostructures by low-temperature Hydrogen atoms processingExternal link," J. Phys. Chem. C 116 (43), 23004-23012 (2012).

149  S. Babin, G. Glushenko, T. Weber, T. Käsebier, A. Szeghalmi, E.-B. Kley, "Application of double patterning technology to fabricate optical elements: Process simulation, fabrication, and measurementExternal link," J. Vac. Sci. Technol. B 30, 031605 (2012).

148  S. Richter, A. Plech, M. Steinert, M. Heinrich, S. Döring, F. Zimmermann, U. Peschel, E.-B. Kley, A. Tünnermann, S. Nolte, "On the fundamental structure of femtosecond laser-induced nanogratingsExternal link," Laser Photon. Rev. 6 (6), 787-792 (2012).

147  C. Helgert, K. Dietrich, D. Lehr, T. Käsebier, T. Pertsch, E.-B. Kley, "A dedicated multilayer technique for the fabrication of three-dimensional metallic nanoparticlesExternal link," Microelectron. Eng. 97, 181-184 (2012).

146  G. Kalkowski, U. Zeitner, T. Benkenstein, J. Fuchs, C. Rothhardt, R. Eberhardt, "Direct wafer bonding for encapsulation of fused silica optical gratingsExternal link," Microelectron. Eng. 97, 177-180 (2012).

145  T. Weber, T. Käsebier, A. Szeghalmi, M. Knez, E.-B. Kley, A. Tünnermann, "High aspect ratio deep UV wire grid polarizer fabricated by double patterningExternal link," Microelectron. Eng. 98, 433-435 (2012).

144  I. Bergmair, W. Hackl, M. Losurdo, C. Helgert, G. Isic, M. Rohn, M. M. Jakovljevic, T. Mueller, M. Giangregorio, E.-B. Kley, T. Fromherz, R. Gajic, T. Pertsch, G. Bruno, M. Muehlberger, "Nano- and microstructuring of graphene using UV-NILExternal link," NanoTechnology 23, 335301 (2012).

143  A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E.-B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, M. Segev, "Sparsity-based single-shot subwavelength coherent diffractive imagingExternal link," Nat. Mater. 11 (5), 455-459 (2012).

142  C. Braig, L. Fritzsch, T. Käsebier, E. B. Kley, C. Laubis, Y. Liu, F. Scholze, A. Tünnermann, "An EUV beamsplitter based on conical grazing incidence diffractionExternal link," Opt. Express 20 (2), 1825-1838 (2012).

141  F. Burmeister, U.D. Zeitner, S. Nolte, A. Tünnermann, "High numerical aperture hybrid optics for two-photon polymerizationExternal link," Opt. Express 20 (7), 7994-8005 (2012).

140  M. Britzger, M. H. Wimmer, A. Khalaidovski, D. Friedrich, S. Kroker, F. Brückner, E.-B. Kley, A. Tünnermann, K. Danzmann, R. Schnabel, "Michelson interferometer with diffractively-coupled arm resonators in second-order Littrow configurationExternal link," Opt. Express 20 (23), 25400-25408 (2012).

139  M. Schulze, M. Damm, M. Helgert, E.-B. Kley, S. Nolte, A. Tünnermann, "Durability of stochastic antireflective structures - analyses on damage thresholds and adsorbate eliminationExternal link," Opt. Express 20 (16), 18348-18355 (2012).

138  S. Steiner, S. Kroker, T. Käsebier, E.-B. Kley, A. Tünnermann, "Angular bandpass filters based on dielectric resonant waveguide gratingsExternal link," Opt. Express 20 (20), 22555-22562 (2012).

137  T. W. H. Oates, B. Dastmalchi, G. Isic, S. Tollabimazraehno, C. Helgert, T. Pertsch, E.-B. Kley, M. A. Verschuuren, I. Bergmair, K. Hingerl , "Oblique incidence ellipsometric characterization and the substrate dependence of visible frequency fishnet metamaterialsExternal link," Opt. Express 20 (10), 11166-11177 (2012).

136  D. Lehr, K. Dietrich, C. Helgert, T. Käsebier, H.-J. Fuchs, A. Tünnermann, E.-B. Kley, "Plasmonic properties of aluminum nanorings generated by double patterningExternal link," Opt. Lett. 37 (2), 157-159 (2012).

135  M. Britzger, A. Khalaidovski, B. Hemb, E. B. Kley, F. Brückner, R. H. Rinkleff, K. Danzmann, R. Schnabel, "External-cavity diode laser in second-order Littrow configurationExternal link," Opt. Lett. 37 (15), 3117-3119 (2012).

134  C. Schmidt, M. Liebsch, A. E. Klein, N. Janunts, A. Chipouline, T. Käsebier, C. Etrich, F. Lederer, E.-B. Kley, A. Tünnermann, T. Pertsch, "Near-field mapping of optical eigenstates in coupled disk microresonatorsExternal link," Phys. Rev. A 85, 033827 (2012).

133  J. Reinhold, M. R. Shcherbakov, A. Chipouline, V. I. Panov, C. Helgert, T. Paul, C. Rockstuhl, F. Lederer, E.-B. Kley, A. Tünnermann, A.A. Fedyanin, T. Pertsch, "Contribution of the magnetic resonance to the third harmonic generation from a fishnet metamaterialExternal link," Phys. Rev. B 86, 115401 (2012).

132  M. Britzger, D. Friedrich, S. Kroker, F. Brückner, O. Burmeister, E.-B. Kley, A. Tünnermann, K. Danzmann, R. Schnabel, "Pound-Drever-Hall error signals for the length control of three-port grating coupled cavitiesExternal link," Appl. Optics 50 (22), 4340-4346 (2011).

131  C. Helgert, C. Rockstuhl, C. Etrich, E. B. Kley, A. Tünnermann, F. Lederer, T. Pertsch, "Effects of anisotropic disorder in an optical metamaterialExternal link," Appl. Phys. A-Mater. Sci. Process. 103 (3), 591-595 (2011).

130  C. Kern, M. Zuerch, J. Petschulat, T. Pertsch, B. Kley, T. Käsebier, U. Hübner, C. Spielmann, "Comparison of femtosecond laser-induced damage on unstructured vs. nano-structured Au-targetsExternal link," Appl. Phys. A-Mater. Sci. Process. 104 (1), 15-21 (2011).

129  C. Schmidt, A. Chipouline, T. Käsebier, E. B. Kley, A. Tünnermann, T. Pertsch, "Temperature induced nonlinearity in coupled microresonatorsExternal link," Appl. Phys. A-Mater. Sci. Process. 104 (3), 503-511 (2011).

128  C. Helgert, E. Pshenay-Severin, M. Falkner, C. Menzel, C. Rockstuhl, E.-B. Kley, A. Tünnermann, F. Lederer, T. Pertsch, "Chiral Metamaterial Composed of Three-Dimensional Plasmonic NanostructuresExternal link," Nano Lett. 11 (10), 4400-4404 (2011).

127  T. Weber, T. Käsebier, A. Szeghalmi, M. Knez, E.-B. Kley, A. Tünnermann, , "Iridium wire grid polarizer fabricated using atomic layer depositionExternal link," Nanoscale Res. Lett. 6, 558 (2011).

126  I. Bergmair, B. Dastmalchi, M. Bergmair, A. Saeed, W. Hilber, G. Hesser, C. Helgert, E. Pshenay-Severin, T. Pertsch, E. B. Kley, U. Hübner, N. H. Shen, R. Penciu, M. Kafesaki, C. M. Soukoulis, K. Hingerl, M. Muehlberger, R. Schoeftner, "Single and multilayer metamaterials fabricated by nanoimprint lithographyExternal link," NanoTechnology 22 (32), 325301 (2011).

125  I. Bergmair, B. Dastmalchi, M. Bergmair, A. Saeed, W. Hilber, G. Hesser, C. Helgert, E. Pshenay-Severin, T. Pertsch, E.-B. Kley, U. Hübner, N.H. Shen, R. Penciu, M. Kafesaki, C.M. Soukoulis, K. Hingerl, M. Mühlberger, R. Schoeftner, "Metamaterials fabricated by Nanoimprint LithographyExternal link," NanoTechnology 22, 325301 (2011).

124  C. Braig, P. Predehl, E.-B. Kley, "Efficient extreme ultraviolet transmission gratings for plasma diagnosticsExternal link," Opt. Eng. 50 (6), 66501 (2011).

123  C. Braig, T. Käsebier, E. B. Kley, A. Tünnermann, "Stand-alone diamond binary phase transmission gratings for the EUV bandExternal link," Opt. Express 19 (15), 14008-14017 (2011).

122  D. Friedrich, B. W. Barr, F. Brückner, S. Hild, J. Nelson, J. Macarthur, M. V. Plissi, M. P. Edgar, S. H. Huttner, B. Sorazu, S. Kroker, M. Britzger, E.-B. Kley, K. Danzmann, A. Tünnermann, K. A. Strain, R. Schnabel, "Waveguide grating mirror in a fully suspended 10 meter Fabry-Perot cavityExternal link," Opt. Express 19 (16), 14955-14963 (2011).

121  M. Britzger, D. Friedrich, S. Kroker, F. Brückner, O. Burmeister, E.-B. Kley, A. Tünnermann, K. Danzmann, R. Schnabel, "Diffractively coupled Fabry-Perot resonator with power-recyclingExternal link," Opt. Express 19 (16), 14964-14975 (2011).

120  M. Oliva, T. Harzendorf, D. Michaelis, U. D. Zeitner, A. Tünnermann, "Multilevel blazed gratings in resonance domain: an alternative to the classical fabrication approachExternal link," Opt. Express 19 (15), 14735-14745 (2011).

119  S. Kroker, T. Käsebier, F. Brückner, F. Fuchs, E.-B. Kley, A. Tünnermann, "Reflective cavity couplers based on resonant waveguide gratingsExternal link," Opt. Express 19 (17), 16466-16479 (2011).

118  W. Freese, T. Kämpfe, W. Rockstroh, E.-B. Kley, A. Tünnermann, "Optimized electron beam writing strategy for fabricating computer-generated holograms based on an effective medium approachExternal link," Opt. Express 19 (9), 8684-8692 (2011).

117  Y.-Y. Yang, F. Suessmann, S. Zherebtsov, I. Pupeza, J. Kaster, D. Lehr, H.-J. Fuchs, E.-B. Kley, E. Fill, X.-M. Duan, Z.-S. Zhao, F. Krausz, S. L. Stebbings, M. F. Kling, "Optimization and characterization of a highly-efficient diffraction nanograting for MHz XUV pulsesExternal link," Opt. Express 19 (3), 1954-1962 (2011).

116  B. W. Barr, M. P. Edgar, J. Nelson, M. V. Plissi, S. H. Huttner, B. Sorazu, K. A. Strain, O. Burmeister, M. Britzger, D. Friedrich, R. Schnabel, K. Danzmann, J. Hallam, A. Freise, T. Clausnitzer, F. Brückner, E. B. Kley, A. Tünnermann, "Translational, rotational, and vibrational coupling into phase in diffractively coupled optical cavitiesExternal link," Opt. Lett. 36 (14), 2746-2748 (2011).

115  F. Brückner, S. Kroker, D. Friedrich, E.-B. Kley, A. Tünnermann, "Widely tunable monolithic narrowband grating filter for near-infrared radiationExternal link," Opt. Lett. 36 (4), 436-438 (2011).

114  G. Andriukaitis, D. Kartashov, D. Lorenc, A. Pugzlys, A. Baltuska, L. Giniunas, R. Danielius, J. Limpert, T. Clausnitzer, E. B. Kley, A. Voronin, A. Zheltikov, "Hollow-fiber compression of 6 mJ pulses from a continuous-wave diode-pumped single-stage Yb, Na:CaF(2) chirped pulse amplifierExternal link," Opt. Lett. 36 (10), 1914-1916 (2011).

113  M. Schulze, D. Lehr, M. Helgert, E.-B. Kley, A. Tünnermann, "Transmission enhanced optical lenses with self-organized antireflective subwavelength structures for the UV rangeExternal link," Opt. Lett. 36 (19), 3924-3926 (2011).

112  S. Kroker, F. Brückner, E.-B. Kley, A. Tünnermann, "Enhanced angular tolerance of resonant waveguide grating reflectorsExternal link," Opt. Lett. 36 (4), 537-539 (2011).

111  T. Weber, T. Käsebier, E.-B. Kley, A. Tünnermann, "Broadband iridium wire grid polarizer for UV applicationsExternal link," Opt. Lett. 36 (4), 445-447 (2011).

110  M. Mayer, C. Grevent, A. Szeghalmi, M. Knez, M. Weigand, S. Rehbein, G. Schneider, B. Baretzky, G. Schütz, "Multilayer Fresnel zone plate for soft X-ray microscopy resolves sub 39-nm structuresExternal link," UltraMicroscopy 111, 1706-1711 (2011).

109  Y. Liu, H.-J. Fuchs, Z. Liu, H. Chen, S. He, S. Fu, E.-B. Kley, A. Tünnermann, "Investigation on the properties of a laminar grating as a soft x-ray beam splitterExternal link," Appl. Optics 49 (23), 4450-4459 (2010).

108  R. Geiss, S. Diziain, R. Iliew, C. Etrich, H. Hartung, N. Janunts, F. Schrempel, F. Lederer, T. Pertsch, E. B. Kley, "Light propagation in a free-standing lithium niobate photonic crystal waveguideExternal link," Appl. Phys. B-Lasers Opt. 97 (13), 131109 (2010).

107  M. P. Edgar, B. W. Barr, J. Nelson, M. V. Plissi, K. A. Strain, O. Burmeister, M. Britzger, K. Danzmann, R. Schnabel, T. Clausnitzer, F. Brückner, E.-B. Kley, A. Tünnermann, "Experimental demonstration of a suspended, diffractively coupled Fabry-Perot cavityExternal link," ChemPhysChem 27 (8), (2010).

106  A. Szeghalmi, E. B. Kley, M. Knez, "Theoretical and Experimental Analysis of the Sensitivity of Guided Mode Resonance SensorsExternal link," J. Non-Cryst. Solids 114 (49), 21150-21157 (2010).

105  I. Bergmair, M. Muehlberger, K. Hingerl, E. Pshenay-Severin, T. Pertsch, E. B. Kley, H. Schmidt, R. Schoeftner, "3D materials made of gold using Nanoimprint LithographyExternal link," Microelectron. Eng. 87 (5-8), 1008-1010 (2010).

104  H. Hartung, E.-B. Kley, T. Gischkat, F. Schrempel, W. Wesch, A. Tünnermann, "Ultra thin high index contrast photonic crystal slabs in lithium niobateExternal link," Opt. Mater. 33 (1), 19-21 (2010).

103  L. Stürzebecher, T. Harzendorf, U. Vogler, U.D. Zeitner, R. Voelkel, "Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effectExternal link," Opt. Express 18, 19485-19494 (2010).

102  R. Voelkel, U. Vogler, A. Bich, P. Pernet, K.J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stürzebecher, T. Harzendorf, U.D. Zeitner, "Advanced Mask Aligner Lithography: New Illumination SystemExternal link," Opt. Express 18, 20968-20978 (2010).

101  C. Schmidt, A. Chipouline, T. Käsebier, E.-B. Kley, A. Tünnermann, T. Pertsch, "Thermal nonlinear effects in hybrid silica/polymer microdisksExternal link," Opt. Lett. 35 (20), 3351-3353 (2010).

100  J. Petschulat, C. Helgert, M. Steinert, N. Bergner, C. Rockstuhl, F. Lederer, T. Pertsch, A. Tünnermann, E.-B. Kley, "Plasmonic modes of extreme subwavelength nanocavitiesExternal link," Opt. Lett. 35 (16), 2693-2695 (2010).

99    W. Freese, T. Kämpfe, E.-B. Kley, A. Tünnermann, "Design of binary subwavelength multiphase level computer generated hologramsExternal link," Opt. Lett. 35 (5), 676-678 (2010).

98    C. Menzel, C. Helgert, C. Rockstuhl, E. B. Kley, A. Tünnermann, T. Pertsch, F. Lederer, "Asymmetric Transmission of Linearly Polarized Light at Optical MetamaterialsExternal link," Phys. Rev. Lett. 104 (25), 253902 (2010).

97    F. Brückner, D. Friedrich, T. Clausnitzer, M. Britzger, O. Burmeister, K. Danzmann, E.-B. Kley, A. Tünnermann, and R. Schnabel, "Realization of a Monolithic High-Reflectivity Cavity Mirror from a Single Silicon CrystalExternal link," Phys. Rev. Lett. 104 (16), (2010).

96    C. Menzel, C. Helgert, J. Uepping, C. Rockstuhl, E. B. Kley, R. B. Wehrspohn, T. Pertsch, F. Lederer, "Angular resolved effective optical properties of a Swiss cross metamaterialExternal link," Appl. Phys. B-Lasers Opt. 95 (13), 131104 (2009).

95    S. Babin, A. Bugrov, S. Cabrini, S. Dhuey, A. Goltsov, I. Ivonin, E. B. Kley, C. Peroz, H. Schmidt, V. Yankov, "Digital optical spectrometer-on-chipExternal link," Appl. Phys. B-Lasers Opt. 95 (4), (2009).

94    S. Babin, C. Peroz, A. Bugrov, A. Goltsov, I. Ivonin, V. Yankov, S. Dhuey, S. Cabrini, E. B. Kley, H. Schmidt, "Fabrication of novel digital optical spectrometer on chipExternal link," J. Opt. Soc. Am. B-Opt. Phys. 27 (6), 3187-3191 (2009).

93    I. Bergmair, M. Muehlberger, W. Schwinger, K. Hingerl, E. B. Kley, H. Schmidt, R. Schoeftner, "Reversal mu CP using hard stampsExternal link," Microelectron. Eng. 86 (4-6), 650-653 (2009).

92    T. Gischkat, H. Hartung, F. Schrempel, E. B. Kley, A. Tünnermann, W. Wesch, "Patterning of LiNbO(3) by means of ion irradiation using the electronic energy deposition and wet etchingExternal link," Microelectron. Eng. 86 (4-6), 910-912 (2009).

91    C. Brückner, T. Käsebier, B. Pradarutti, S. Riehemann, G. Notni, E.-B. Kley, A. Tünnermann, "Broadband antireflective structures applied to high resistive float zone silicon in the THz spectral rangeExternal link," Opt. Express 17 (5), 3063-3077 (2009).

90    F. Brückner, D. Friedrich, M. Britzger, T. Clausnitzer, O. Burmeister, E.-B. Kley, K. Danzmann, A. Tünnermann, R. Schnabel, "Encapsulated subwavelength grating as a quasi-monolithic resonant reflectorExternal link," Opt. Express 17 (26), 24334-24341 (2009).

89    F. Brückner, D. Friedrich, T. Clausnitzer, O. Burmeister, M. Britzger, E.-B. Kley, K. Danzmann, A. Tünnermann, R. Schnabel, "Demonstration of a cavity coupler based on a resonant waveguide gratingExternal link," Opt. Express 17 (1), 163-169 (2009).

88    C. Helgert, C. Menzel, C. Rockstuhl, E. Pshenay-Severin, E. B. Kley, A. Chipouline, A. Tünnermann, F. Lederer, T. Pertsch, "Polarization-independent negative-index metamaterial in the near infraredExternal link," Opt. Lett. 34 (5), 704-706 (2009).

87    F. Schrempel, T. Gischkat, H. Hartung, T. Hoeche, E.-B. Kley, A. Tünnermann, W. Wesch, "Ultrathin membranes in x-cut lithium niobateExternal link," Opt. Lett. 34 (9), 1426-1428 (2009).

86    M. P. Edgar, B. W. Barr, J. Nelson, M. V. Plissi, K. A. Strain, O. Burmeister, M. Britzger, K. Danzmann, R. Schnabel, T. Clausnitzer, F. Brückner, E. B. Kley, A. Tünnermann, "Experimental demonstration of a suspended diffractively coupled optical cavityExternal link," Opt. Lett. 34 (20), 3184-3186 (2009).

85    C. Schmidt, A. Chipouline, T. Käsebier, E. B. Kley, A. Tünnermann, T. Pertsch, V. Shuvayev, L. I. Deych, "Observation of optical coupling in microdisk resonatorsExternal link," Phys. Rev. A 80 (4), 043841 (2009).

84    C. Helgert, C. Rockstuhl, C. Etrich, C. Menzel, E.-B. Kley, A. Tünnermann, F. Lederer, T. Pertsch, "Effective properties of amorphous metamaterialsExternal link," Phys. Rev. B 79 (23), 233107 (2009).

83    D. J. Vine, D. M. Paganin, K. M. Pavlov, K. Uesugi, A. Takeuchi, Y. Suzuki, N. Yagi, T. Kämpfe, E.-B. Kley, E. Foerster, "Deterministic Retrieval of Complex Green's Functions Using Hard X RaysExternal link," Phys. Rev. Lett. 102 (4), (2009).

82    P. Hoyer, M. Theuer, R. Beigang, E. B. Kley, "Terahertz emission from black siliconExternal link," Appl. Phys. B-Lasers Opt. 93 (9), (2008).

81    R. Heming, L.-C. Wittig, P. Dannberg, J. Jahns, E.-B. Kley, M. Gruber, "Efficient Planar-Integrated Free-Space Optical Interconnects Fabricated by a Combination of Binary and Analog LithographyExternal link," J. Lightwave Technol. 26 (13-16), 2136-2141 (2008).

80    T. Kämpfe, E.-B. Kley, A. Tünnermann, "Designing multiplane computer-generated holograms with consideration of the pixel shape and the illumination waveExternal link," J. Opt. Soc. Am. A-Opt. Image Sci. Vis. 25 (7), 1609-1622 (2008).

79    A. K. Bansal, W. Holzer, A. Penzkofer, E. B. Kley, "Spectroscopic and lasing characterisation of a dicarbazovinylene-MEH-benzene dyeExternal link," Opt. Commun. 281 (14), 3806-3819 (2008).

78    T. Clausnitzer, T. Kämpfe, E. B. Kley, A. Tünnermann, A. V. Tishchenko, O. Parriaux, "Highly-dispersive dielectric transmission gratings with 100% diffraction efficiencyExternal link," Opt. Express 16 (8), 5577-5584 (2008).

77    D. Friedrich, O. Burmeister, A. Bunkowski, T. Clausnitzer, S. Fahr, E.-B. Kley, A. Tünnermann, K. Danzmann, R. Schnabel, "Diffractive beam splitter characterization via a power-recycled interferometerExternal link," Opt. Lett. 33 (2), 101-103 (2008).

76    F. Brückner, T. Clausnitzer, O. Burmeister, D. Friedrich, E.-B. Kley, K. Danzmann, A. Tünnermann, R. Schnabel, "Monolithic dielectric surfaces as new low-loss light-matter interfacesExternal link," Opt. Lett. 33 (3), 264-266 (2008).

75    H. Hartung, E.-B. Kley, A. Tünnermann, T. Gischkat, F. Schrempel, W. Wesch, "Fabrication of ridge waveguides in zinc-substituted lithium niobate by means of ion-beam enhanced etchingExternal link," Opt. Lett. 33 (20), 2320-2322 (2008).

74    T. Clausnitzer, T. Kämpfe, F. Brückner, R. Heinze, E.-B. Kley, A. Tünnermann, "Reflection-reduced encapsulated transmission gratingExternal link," Opt. Lett. 33 (17), 1972-1974 (2008).

73    U. D. Zeitner, M. Banasch, E.-B. Kley, "The making of a computer-generated hologramExternal link," Photon. Spect. 42 (12), 58-61 (2008).

72    A. K. Bansal, W. Holzer, A. Penzkofer, H.-H. Hoerhold, E. Klemm, W. Frank, E. B. Kley, "Spectroscopic and lasing characterisation of a luminescent phenylene/bipyridine polymerExternal link," Synth. Met. 158 (19-20), 758-766 (2008).

71    S. Fahr, T. Clausnitzer, E.-B. Kley, A. Tünnermann, "Reflective diffractive beam splitter for laser interferometersExternal link," Appl. Optics 46 (24), 6092-6095 (2007).

70    T. Clausnitzer, T. Kämpfe, E.-B. Kley, A. Tünnermann, A. Tishchenko, O. Parriaux, "Investigation of the polarization-dependent diffraction of deep dielectric rectangular transmission gratings illuminated in Littrow mountingExternal link," Appl. Optics 46 (6), 819-826 (2007).

69    T. Kämpfe, E.-B. Kley, A. Tünnermann, P. Dannberg, "Design and fabrication of stacked, computer generated holograms for multicolor image generationExternal link," Appl. Optics 46 (22), 5482-5488 (2007).

68    J. Thomas, E. Wikszak, T. Clausnitzer, U. Fuchs, U. Zeitner, S. Nolte, A. Tünnermann, "Inscription of fiber Bragg gratings with femtosecond pulses using a phase mask scanning techniqueExternal link," Appl. Phys. A-Mater. Sci. Process. 86 (2), 153-157 (2007).

67    T. Glinsner, P. Lindner, M. Muehlberger, I. Bergmair, R. Schoeftner, K. Hingerl, H. Schmid, E.-B. Kley, "Fabrication of 3D-photonic crystals via UV-nanoimprint lithographyExternal link," J. Opt. Soc. Am. B-Opt. Phys. 25 (6), 2337-2340 (2007).

66    M. Muehlberger, I. Bergmair, W. Schwinger, M. Gmainer, R. Schoeftner, T. Glinsner, C. Hasenfuss, K. Hingerl, M. Vogler, H. Schmidt, E. B. Kley, "A Moire method for high accuracy alignment in nanoimprint lithographyExternal link," Microelectron. Eng. 84 (5-8), 925-927 (2007).

65    M. Vogler, S. Wiedenberg, M. Muehlberger, I. Bergmair, T. Glinsner, H. Schmidt, E.-B. Kley, G. Gruetzner, "Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithographyExternal link," Microelectron. Eng. 84 (5-8), 984-988 (2007).

64    J. A. Fueloep, Z. Major, A. Henig, S. Kruber, R. Weingartner, T. Clausnitzer, E.-B. Kley, A. Tünnermann, V. Pervak, A. Apolonski, J. Osterhoff, R. Hoerlein, F. Krausz, S. Karsch, "Short-pulse optical parametric chirped-pulse amplification for the generation of high-power few-cycle pulsesExternal link," New J. Phys. 9, (2007).

63    R. Nawrodt, A. Zimmer, T. Koettig, T. Clausnitzer, A. Bunkowski, E. B. Kley, R. Schnabel, K. Danzmann, S. Nietzsche, W. Vodel, A. Tünnermann, P. Seidel, "Mechanical Q-factor measurements on a test mass with a structured surfaceExternal link," New J. Phys. 9, (2007).

62    D. Radtke, J. Duparre, U. D. Zeitner, A. Tünnermann, "Laser lithographic fabrication and characterization of a spherical artificial compound eyeExternal link," Opt. Express 15 (6), 3067-3077 (2007).

61    R. Iliew, C. Etrich, M. Augustin, E. B. Kley, S. Nolte, A. Tünnermann, F. Lederer, "Linear and nonlinear effects of light propagation in low-index photonic crystal slabsExternal link," Phys. Status Solidi A-Appl. Mat. 204 (11), 3689-3707 (2007).

60    M. Augustin, R. Iliew, C. Etrich, F. Setzpfandt, H.-J. Fuchs, E.-B. Kley, S. Nolte, T. Pertsch, F. Lederer, A. Tünnermann, "Dispersion properties of photonic crystal waveguides with a low in-plane index contrastExternal link," New J. Phys. 8, 210 (2006).

59    F. Schrempel, T. Gischkat, H. Hartung, E. B. Kley, W. Wesch, "Ion beam enhanced etching of LiNbO3External link," Nucl. Instrum. Methods Phys. Res. Sect. B-Beam Interact. Mater. Atoms 250, 164-168 (2006).

58    A. Bunkowski, O. Burmeister, K. Danzmann, R. Schnabel, T. Clausnitzer, E. B. Kley, A. Tünnermann, "Demonstration of three-port grating phase relationsExternal link," Opt. Lett. 31 (16), 2384-2386 (2006).

57    U. Fuchs, U. Zeitner, A. Tünnermann, "Hybrid optics for focusing ultrashort laser pulsesExternal link," Opt. Lett. 31 (10), 1516-1518 (2006).

56    M. Augustin, R. Iliew, C. Etrich, D. Schelle, H. Fuchs, U. Peschel, S. Nolte, E. Kley, F. Lederer, A. Tünnermann, "Self-guiding of infrared and visible light in photonic crystal slabsExternal link," Appl. Phys. A-Mater. Sci. Process. 81 (2-3), 313-319 (2005).

55    T. Clausnitzer, A. Tishchenko, E. Kley, H. Fuchs, D. Schelle, "Narrowband, polarization-independent free-space wave notch filterExternal link," J. Opt. Soc. Am. A-Opt. Image Sci. Vis. 22 (12), 2799-2803 (2005).

54    T. Clausnitzer, E. Kley, A. Tünnermann, A. Bunkowski, O. Burmeister, K. Danzmann, R. Schnabel, S. Gliech, A. Duparre, "Ultra low-loss low-efficiency diffraction gratingsExternal link," Opt. Express 13 (12), 4370-4378 (2005).

53    T. Clausnitzer, T. Kampfe, E. Kley, A. Tünnermann, U. Peschel, A. Tishchenko, O. Parriaux, "An intelligible explanation of highly-efficient diffraction in deep dielectric rectangular transmission gratingsExternal link," Opt. Express 13 (26), 10448-10456 (2005).

52    U. Fuchs, U. Zeitner, A. Tünnermann, "Ultra-short pulse propagation in complex optical systemsExternal link," Opt. Express 13 (10), 3852-3861 (2005).

51    S. Wise, V. Quetschke, A. Deshpande, G. Müller, D. Reitze, D. Tanner, B. Whiting, Y. Chen, A. Tünnermann, E. Kley, T. Clausnitzer, "Phase effects in the diffraction of light: Beyond the grating equationExternal link," Phys. Rev. Lett. 95 (1), 013901 (2005).

50    T. Kaempfe, E.-B. Kley, A. Tünnermann, "Design and fabrication of refractive and diffractive micro optical elements used in holographic recording setupsExternal link," 5965 (596503) (2005).

49    M. Augustin, H. Fuchs, D. Schelle, E. Kley, S. Nolte, A. Tünnermann, R. Iliew, C. Etrich, U. Peschel, F. Lederer, "High transmission and single-mode operation in low-index-contrast photonic crystal waveguide devicesExternal link," Appl. Phys. B-Lasers Opt. 84 (5), 663-665 (2004).

48    R. Iliew, C. Etrich, U. Peschel, F. Lederer, M. Augustin, H. Fuchs, D. Schelle, E. Kley, S. Nolte, A. Tünnermann, "Diffractionless propagation of light in a low-index photonic-crystal filmExternal link," Appl. Phys. B-Lasers Opt. 85 (24), 5854-5856 (2004).

47    M. Augustin, R. Iliew, H. Fuchs, U. Peschel, E. Kley, S. Nolte, F. Lederer, A. Tünnermann, "Investigation of photonic crystals with a low in-plane index contrastExternal link," Jpn. J. Appl. Phys. 43 (8B), 5805-5808 (2004).

46    B. Schnabel, K. Gunther, H. Eichhorn, J. Gramss, D. Beyer, E. Kley, W. Rockstroh, "Fast data preparation for high-quality and large-area computer generated hologram fabricationExternal link," Microelectron. Eng. 73-4 (SI), 80-84 (2004).

45    H. Elfstrom, T. Vallius, M. Kuittinen, J. Turunen, T. Clausnitzer, E. Kley, "Diffractive elements with novel antireflection film stacksExternal link," Opt. Express 12 (25), 6385-6390 (2004).

44    A. Bunkowski, O. Burmeister, P. Beyersdorf, K. Danzmann, R. Schnabel, T. Clausnitzer, E. Kley, A. Tünnermann, "Low-loss grating for coupling to a high-finesse cavityExternal link," Opt. Lett. 29 (20), 2342-2344 (2004).

43    W. Holzer, A. Penzkofer, A. Lux, H. Horhold, E. Kley, "Photo-physical and lasing characterisation of neat films of a thianthrene-substituted distyrylbenzene dye (Thianthrene-DSB)External link," Synth. Met. 145 (2-3), 119-127 (2004).

42    T. Clausnitzer, J. Limpert, K. Zollner, H. Zellmer, H. Fuchs, E. Kley, A. Tünnermann, M. Jupe, D. Ristau, "Highly efficient transmission gratings in fused silica for chirped-pulse amplification systemsExternal link," Appl. Optics 42 (34), 6934-6938 (2003).

41    J. Ruske, B. Zeitner, A. Tünnermann, A. Rasch, "Photorefractive effect and high power transmission in LiNbO3 channel waveguidesExternal link," C. R. Phys. 39 (14), 1048-1050 (2003).

40    J. Ruske, E. Werner, B. Zeitner, A. Tünnermann, "Integrated optical ultrashort-pulse picker with high extinction ratioExternal link," C. R. Phys. 39 (20), 1442-1443 (2003).

39    R. Herda, A. Liem, B. Schnabel, A. Drauschke, H. Fuchs, E. Kley, H. Zellmer, A. Tünnermann, "Efficient side-pumping of fibre lasers using binary gold diffraction gratingsExternal link," C. R. Phys. 39 (3), 276-277 (2003).

38    L. Wittig, E. Kley, A. Tünnermann, "Micro- and nanostructured optics," Electron. Lett. 76 (C2), 41-46 (2003).

37    V. Yankov, S. Babin, I. Ivonin, A. Goltsov, A. Morozov, L. Polonskiy, M. Spector, A. Talapov, E. Kley, H. Schmidt, "Multiwavelength Bragg gratings and their application to optical MUX/DEMUX devicesExternal link," IEEE Photonics Technol. Lett. 15 (3), 410-412 (2003).

36    E. Werner, J. Ruske, B. Zeitner, W. Biehlig, A. Tünnermann, "Integrated-optical amplitude modulator for high power applicationsExternal link," Opt. Commun. 221 (1-3), 9-12 (2003).

35    M. Augustin, H. Fuchs, D. Schelle, E. Kley, S. Nolte, A. Tünnermann, R. Iliew, C. Etrich, U. Peschel, F. Lederer, "Highly efficient waveguide bends in photonic crystal with a low in-plane index contrastExternal link," Opt. Express 11 (24), 3284-3289 (2003).

34    J. Limpert, T. Clausnitzer, A. Liem, T. Schreiber, H. Fuchs, H. Zellmer, E. Kley, A. Tünnermann, "High-average-power femtosecond fiber chirped-pulse amplification systemExternal link," Opt. Lett. 28 (20), 1984-1986 (2003).

33    C. Bauer, B. Schnabel, E. Kley, U. Scherf, H. Giessen, R. Mahrt, "Two-photon pumped lasing from a two-dimensional photonic bandgap structure with polymeric gain materialExternal link," Adv. Eng. Mater. 14 (9), 673-676 (2002).

32    T. Glaser, S. Schröter, H. Bartelt, H. Fuchs, E. Kley, "Diffractive optical isolator made of high-efficiency dielectric gratings onlyExternal link," Appl. Optics 41 (18), 3558-3566 (2002).

31    U. Grusemann, B. Zeitner, M. Rottschalk, J. Ruske, A. Tünnermann, A. Rasch, "Integrated-optical wavelength sensor with self-compensation of thermally induced phase shifts by use of a LiNbO3 unbalanced Mach-Zehnder interferometerExternal link," Appl. Optics 41 (29), 6211-6219 (2002).

30    W. Holzer, A. Penzkofer, T. Pertsch, N. Danz, A. Bräuer, E. Kley, H. Tillmann, C. Bader, H. Horhold, "Corrugated neat thin-film conjugated polymer distributed-feedback lasersExternal link," Appl. Phys. A-Mater. Sci. Process. 74 (4-5), 333-342 (2002).

29    N. Moll, R. Mahrt, C. Bauer, H. Giessen, B. Schnabel, E. Kley, U. Scherf, "Erratum: Evidence for bandedge lasing in a two-dimensional photonic bandgap polymer laser External link," Appl. Phys. B-Lasers Opt. 80 (14), 2610 (2002).

28    N. Moll, R. Mahrt, C. Bauer, H. Giessen, B. Schnabel, E. Kley, U. Scherf, "Evidence for bandedge lasing in a two-dimensional photonic bandgap polymer laserExternal link," Appl. Phys. B-Lasers Opt. 80 (5), 734-736 (2002).

27    J. Limpert, T. Schreiber, T. Clausnitzer, K. Zollner, H. Fuchs, E. Kley, H. Zellmer, A. Tünnermann, "High-power femtosecond Yb-doped fiber amplifierExternal link," Opt. Express 10 (14), 628-638 (2002).

26    C. Bauer, H. Giessen, B. Schnabel, E. Kley, C. Schmitt, U. Scherf, R. Mahrt, "A surface-emitting circular grating polymer laserExternal link," Adv. Eng. Mater. 13 (15), 1161 (2001).

25    S. Buhling, F. Wyrowski, E. Kley, A. Nellissen, L. Wang, M. Dirkzwager, "Resolution enhanced proximity printing by phase and amplitude modulating masksExternal link," J. Microelectromech. Syst. 11 (5), 603-611 (2001).

24    B. Schnabel, E. Kley, "On the influence of the e-beam writer address grid on the optical quality of high-frequency gratingsExternal link," Microelectron. Eng. 57-8, 327-333 (2001).

23    L. Wittig, A. Cumme, T. Harzendorf, E. Kley, "Intermittence effect in electron beam writingExternal link," Microelectron. Eng. 57-8, 321-326 (2001).

22    M. Barge, S. Bruynooghe, F. Clube, A. Nobari, J. Saussol, E. Grass, H. Mayer, B. Schnabel, E. Kley, "120-nm lithography using off-axis TIR holography and 364 nm exposure wavelengthExternal link," Microelectron. Eng. 57-8, 59-63 (2001).

21    L.-C. Wittig, M. Cumme, S. Nolte, E.-B. Kley, A. Tünnermann, "Beam shaping for multimode beamsExternal link," 4440(34) (2001).

20    C. Gimkiewicz, D. Hagedorn, J. Jahns, E. Kley, F. Thoma, "Fabrication of microprisms for planar optical interconnections by use of analog gray-scale lithography with high-energy-beam-sensitive glassExternal link," Appl. Optics 38 (14), 2986-2990 (1999).

19    U. Zeitner, B. Schnabel, E. Kley, F. Wyrowski, "Polarization multiplexing of diffractive elements with metal-stripe grating pixelsExternal link," Appl. Optics 38 (11), 2177-2181 (1999).

18    U. Zeitner, H. Aagedal, F. Wyrowski, "Comparison of resonator-originated and external beam shapingExternal link," Appl. Optics 38 (6), 980-986 (1999).

17    U. Zeitner, F. Wyrowski, "High modal discrimination for laser resonators with Gaussian output beamExternal link," J. Mod. Opt. 46 (9), 1309-1314 (1999).

16    P. Dannberg, L. Erdmann, R. Bierbaum, A. Krehl, A. Bräuer, E. Kley, "Micro-optical elements and their integration to glass and optoelectronic wafersExternal link," Microsyst. Technol. 6 (2), 41-47 (1999).

15    B. Schnabel, E. Kley, F. Wyrowski, "Study on polarizing visible light by subwavelength-period metal-stripe gratingsExternal link," Opt. Eng. 38 (2), 220-226 (1999).

14    E.-B. Kley, L.-C. Wittig, M. Cumme, U.D. Zeitner, P. Dannberg, "Fabrication and properties of refractive micro-optical beam-shaping elementsExternal link," 3879 (20) (1999).

13    L.-C. Wittig, E.-B. Kley, "Approximation of refractive micro-optical profiles by minimal surfacesExternal link," 3879 (32) (1999).

12    V. Pavelyev, V. Soifer, M. Duparre, R. Kowarschik, B. Ludge, B. Kley, "Iterative calculation, manufacture and investigation of DOE forming unimodal complex distributionExternal link," Opt. Lasers Eng. 29 (4-5), 269-279 (1998).

11    R. Waldhäusl, B. Schnabel, P. Dannberg, E. Kley, A. Bräuer, W. Karthe, "Efficient coupling into polymer waveguides by gratingsExternal link," Appl. Optics 36 (36), 9383-9390 (1997).

10    R. Waldhäusl, B. Schnabel, E. Kley, A. Bräuer, "Efficient focusing polymer waveguide grating couplersExternal link," Electron. Lett. 33 (7), 623-624 (1997).

9      K. Blüthner, M. Götz, A. Hadicke, W. Krech, T. Wagner, H. Mühlig, H. Fuchs, U. Hubner, D. Schelle, E. Kley, L. Fritzsch, "Single-electron transistors based on Al/AlOx/Al and Nb/AlOx/Nb tunnel junctionsExternal link," IEEE Trans. Appl. Supercond. 7 (2, Part 3), 3099-3102 (1997).

8      E. Kley, "Continuous profile writing by electron and optical lithographyExternal link," Microelectron. Eng. 34 (3-4), 261-298 (1997).

7      M. Golub, M. Duparre, E. Kley, R. Kowarschik, B. Ludge, W. Rockstroh, H. Fuchs, "New diffractive beam shaper generated with the aid of e-beam lithographyExternal link," Opt. Eng. 35 (5), 1400-1406 (1996).

6      M. Götz, K. Blüthner, W. Krech, A. Nowack, H. Fuchs, E. Kley, P. Thieme, T. Wagner, G. Eska, K. Hecker, H. Hegger, "Self-aligned in-line tunnel junctions for single-charge electronicsExternal link," Physica B 218 (1-4), 272-275 (1996).

5      M. Götz, K. Blüthner, W. Krech, A. Nowack, H. Fuchs, E. Kley, P. Thieme, T. Wagner, G. Eska, K. Hecker, H. Hegger, "Preparation of self?aligned in?line tunnel junctions for applications in single?charge electronics External link," J. Appl. Phys. 78 (9), 5499-5502 (1995).

4      W. Brunger, E. Kley, C. Schnabel, I. Stolberg, M. Zierbock, R. Plontke, "Low energy lithography; energy control and variable energy exposureExternal link," Microelectron. Eng. 27 (1-4), 135-138 (1995).

3      H. Meyer, H. Kohler, A. Chwala, K. Blüthner, P. Weber, E. Kley, W. Rockstroh, "Microwave circuit for the generation of Josephson voltages at low frequenciesExternal link," Supercond. Sci. Technol. 7 (5), 327-329 (1994).

2      M. Manzel, H. Bruchlos, E. Steinbeiss, T. Eick, M. Klinger, J. Fuchs, B. Kley, "TiBaCaCuO-films for passive microwave devicesExternal link," Physica C 201 (3-4), 337-339 (1992).

1      W. Zahn, P. Weber, K. Blüthner, E. Kley, "Submicron High Critical Current Density Niobium-Lead Josephson JunctionsExternal link," Phys. Status Solidi A-Appl. Mat. 69 (1), K25-K28 (1982).